Hvis du har foretaget ændringer i Pure, vil de snart blive vist her.

Netværk

Rasmus Christensen

Person: VIP

John C. Mauro

  • Corning Incorporated

Ekstern person

N. M. Anoop Krishnan

  • Indian Institute of Technology Delhi

Ekstern person

Mathieu Bauchy

  • University of California at Los Angeles

Ekstern person

Marcel Potuzak

  • Corning Incorporated

Ekstern person

John C. Mauro

  • Corning Incorporated

Ekstern person

Joachim Deubener

  • Clausthal University of Technology

Ekstern person

M. Potuzak

  • Corning Incorporated

Ekstern person

Francisco Munoz

  • CSIC - Institute of Ceramics and Glass

Ekstern person

John C. Mauro

  • Pennsylvania State University

Ekstern person

Mathieu Bauchy

  • University of California at Los Angeles

Ekstern person

Xiaoju Guo

  • Corning Incorporated

Ekstern person

Longwen Tang

  • University of California at Los Angeles

Ekstern person

Randall E. Youngman

  • Corning Incorporated

Ekstern person

J. C. Mauro

  • Corning Incorporated

Ekstern person

Marcel Potuzak

  • Corning Incorporated

Ekstern person

Randall E. Youngman

  • Corning Incorporated

Ekstern person

J.C. Mauro

  • Corning Incorporated

Ekstern person

Christian G. Hoover

  • Arizona State University

Ekstern person

R. E. Youngman

  • Corning Incorporated

Ekstern person

Han Liu

  • California State University Los Angeles

Ekstern person

Collin J. Wilkinson

  • Pennsylvania State University
  • GlassWRX

Ekstern person

Adam J. Ellison

  • Corning Incorporated

Ekstern person

Carrie L. Hogue

  • Corning Incorporated

Ekstern person

R.E. Youngman

  • Corning Incorporated

Ekstern person

Haizheng Tao

  • Wuhan University of Technology

Ekstern person

Yongjian Yang

  • Pennsylvania State University

Ekstern person

Kevin Li

  • University of California at Los Angeles

Ekstern person

John Christopher Mauro

  • Corning Incorporated

Ekstern person

Steen Mørup

  • Technical University of Denmark

Ekstern person

Liping Huang

  • Rensselaer Polytechnic Institute

Ekstern person

Mathieu Bauchy

  • University of California at Los Angeles

Ekstern person

Xiujian Zhao

  • State Key Laboratory of Silicate Materials for Architectures, Wuhan University of Technology

Ekstern person

Jianrong Qiu

  • Zhejiang University

Ekstern person

Katelyn A. Kirchner

  • Pennsylvania State University

Ekstern person

Rebecca S. Welch

  • Pennsylvania State University

Ekstern person

John Wang

  • National University of Singapore

Ekstern person

Mette Solvang

  • Rockwool International

Ekstern person

Seong H. Kim

  • Pennsylvania State University

Ekstern person

Randall E. Youngman

  • Corning Incorporated

Ekstern person

Karan Doss

  • Pennsylvania State University

Ekstern person

Maryam Kazembeyki

  • Arizona State University

Ekstern person

Lothar Wondraczek

  • University of Jena
  • Friedrich Schiller University Jena

Ekstern person

Grethe Winther

  • Technical University of Denmark

Ekstern person

Edgar D. Zanotto

  • Universidade Federal de São Carlos

Ekstern person

Marcel A. J. Somers

  • Technical University of Denmark

Ekstern person

Ye Xiang

  • University of North Texas

Ekstern person

Yu Teng

  • Zhejiang University
  • Zhejiang Univ, State Key Lab Silicon Mat, Hangzhou

Ekstern person

Douglas C. Allan

  • Corning Incorporated

Ekstern person

A. J. Ellison

  • Corning Incorporated

Ekstern person

C.L. Hogue

  • Corning Incorporated

Ekstern person

James M. Morgan

  • Corning Incorporated

Ekstern person

H. Behrens

  • Leibniz University Hannover

Ekstern person

Michal Bockowski

  • Institute of High-Pressure Physics, Polish Academy of Sciences
  • High Pressure Research Center of the Polish Academy of Sciences

Ekstern person

W. Wang

  • East China University of Science and Technology

Ekstern person

Brett M. Abel

  • Corning Incorporated

Ekstern person

J. Deubener

  • Clausthal University of Technology

Ekstern person

Garth Scannell

  • Rensselaer Polytechnic Institute

Ekstern person

Simon Striepe

  • Clausthal University of Technology

Ekstern person

U. Bauer

  • Leibniz University Hannover

Ekstern person

Bengang Xing

  • Nanyang Technological University

Ekstern person

Ute Bauer

  • Leibniz University Hannover

Ekstern person

G. R. Chen

  • East China University of Science and Technology

Ekstern person

C. L. Hogue

  • Corning Incorporated

Ekstern person

Steen Mørup

  • Technical University of Denmark

Ekstern person

Sylwester J. Rzoska

  • Institute of High-Pressure Physics, Polish Academy of Sciences
  • High Pressure Research Center of the Polish Academy of Sciences

Ekstern person

Simon Striepe

  • Clausthal University of Technolgoy

Ekstern person

Nitya Nand Gosvami

  • Indian Institute of Technology Delhi

Ekstern person

S. Striepe

  • Clausthal University of Technology

Ekstern person

Jincheng Du

  • University of North Texas

Ekstern person

Christina Nørhave Kjær

  • Aalborg University

Ekstern person

Z.H. Gan

  • National High Magnetic Field Laboratory

Ekstern person

Natesan Venkataraman

  • Corning Incorporated

Ekstern person

Quanzhong Zhao

  • Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, State Key Lab High Field Laser Phys, Shanghai

Ekstern person

Siqi Xiao

  • University of California at Los Angeles

Ekstern person

Enigma Bao

  • University of California at Los Angeles

Ekstern person

Fangfang Luo

  • Chinese Academy of Sciences

Ekstern person

Alexander L. Pivovarov

  • Corning Incorporated

Ekstern person

M. Micoulaut

  • Universite Paris Sorbonne - Paris IV

Ekstern person

Shinji Kohara

  • National Institute for Materials Science Tsukuba

Ekstern person

M. Peng

  • South China University of Technology

Ekstern person

Christopher L. LaPierre

  • Corning Incorporated

Ekstern person

Allen Ehrlicher

  • McGill University

Ekstern person

Matthew Mancini

  • Pennsylvania State University

Ekstern person

Mingyeng Peng

  • South China University of Technology

Ekstern person

Haraldur Páll Gunnlaugsson

  • Aarhus University

Ekstern person

Camilla Kirk

  • Aalborg University

Ekstern person

Yixi Zhuang

  • Kyoto University

Ekstern person

Junhua Xie

  • Zhejiang University

Ekstern person

Yibing Dong

  • Nanyang Technological University

Ekstern person

Qinyuan Zhang

  • State Key Laboratory of Luminescent Materials and Devices, School of Materials Science and Engineering, South China University Of Technology

Ekstern person

L. Calvez

  • Université de Rennes 1

Ekstern person

X.H. Zhang

  • Université de Rennes 1

Ekstern person

Raphael M. C. V. Reis

  • Vitreous Materials Laboratory, Federal University of Sao Carlos

Ekstern person

Daniel R. Cassar

  • Universidade Federal de São Carlos
  • Centro Nacional de Pesquisa em Energia e Materiais

Ekstern person

Gary R. Swan

  • Corning Incorporated

Ekstern person

Roman Sajzew

  • Friedrich Schiller University Jena

Ekstern person

Karsten H. Nielsen

  • Friedrich-Alexander University of Erlangen

Ekstern person

Marcel Ceccato

  • Aarhus University

Ekstern person

Yuzhe Cao

  • University of California at Los Angeles

Ekstern person

Geng Lin

  • CAS - Shanghai Institute of Optics and Fine Mechanics

Ekstern person

Boleslaw Lucznik

  • Institute of High-Pressure Physics

Ekstern person

Haraldur Páll Gunnlaugsson

  • Aarhus University

Ekstern person

Danping Chen

  • Chinese Academy of Sciences

Ekstern person

K.H. Nielsen

  • Friedrich-Alexander University Erlangen-Nürnberg

Ekstern person

Abigail J. Deloria

  • Medical University of Vienna

Ekstern person

I. Hung

  • National High Magnetic Field Laboratory

Ekstern person

Huaihai Pan

  • Chinese Academy of Sciences

Ekstern person

Jiajia Zhou

  • Zhejiang University

Ekstern person

Mark E. Mack

  • Corning Incorporated

Ekstern person

Maria Kristjansson

  • Aalborg University

Ekstern person

Sabyasachi Sen

  • University of California at Davis

Ekstern person

Caroline Yang

  • University of California at Los Angeles

Ekstern person

Madoka Ono

  • Hokkaido University
  • AGC Inc.

Ekstern person

Lothar Lothar Wondraczek

  • University of Jena

Ekstern person

Naduvath Mana Anoop Krishnan

  • Indian Institute of Technology Delhi

Ekstern person

Zhijun Ma

  • Zhejiang University

Ekstern person

Z. Wang

  • Wuhan University

Ekstern person

Scott A. Saxton

  • Corning Incorporated

Ekstern person

Joachim Deubener

  • TU Clausthal

Ekstern person

Eran Bouchbinder

  • Weizmann Institute of Science

Ekstern person

L. Wondraczek

  • Friedrich-Alexander University Erlangen-Nürnberg

Ekstern person

Jianrong Qiu

  • Zhejiang Univ, State Key Lab Silicon Mat, Hangzhou

Ekstern person

Emily Li

  • University of California at Los Angeles

Ekstern person

Sabyasachi Sen

  • University of California at Davis

Ekstern person

Sourav Sahoo

  • Indian Institute of Technology Delhi

Ekstern person

Douglas C. Allan

  • Corning Incorporated

Ekstern person

Xi Wang

  • Kyoto University

Ekstern person

Subramanian Kasimuthumaniyan

  • Indian Institute of Technology Delhi

Ekstern person

Miaojia Guan

  • Zhejiang University

Ekstern person

L. Calvez

  • Université de Rennes 1

Ekstern person

Karen L. Geisinger

  • Corning Incorporated

Ekstern person

H.Z. Tao

  • Wuhan University of Technology

Ekstern person

Harald Behrens

  • Leibniz University Hannover

Ekstern person

Geng Lin

  • Chinese Academy of Sciences

Ekstern person

Haraldur P. Gunnlaugsson

  • Aarhus University

Ekstern person

X.H. Zhang

  • Université de Rennes 1

Ekstern person

Sabyasachi Sen

  • University of California at Davis

Ekstern person

Maja Estrup

  • Aalborg University

Ekstern person

Zhangji Zhao

  • University of California at Los Angeles

Ekstern person