A 32-site neural recording probe fabricated by double-sided deep reactive ion etching of silicon-on-insulator substrates

Peter Norlin, Maria Kindlundh, Aliette Mouroux, Ken Yoshida, Winnie Jensen, Ulrich G. Hofmann

Publikation: Bidrag til bog/antologi/rapport/konference proceedingKonferenceartikel i proceedingForskning

OriginalsprogEngelsk
Titel12th Micromechanics Europe Workshop, MME, 16-18 September 2001, Cork, Ireland
Antal sider4
Publikationsdato2001
StatusUdgivet - 2001

Citer dette

Norlin, P., Kindlundh, M., Mouroux, A., Yoshida, K., Jensen, W., & Hofmann, U. G. (2001). A 32-site neural recording probe fabricated by double-sided deep reactive ion etching of silicon-on-insulator substrates. I 12th Micromechanics Europe Workshop, MME, 16-18 September 2001, Cork, Ireland
Norlin, Peter ; Kindlundh, Maria ; Mouroux, Aliette ; Yoshida, Ken ; Jensen, Winnie ; Hofmann, Ulrich G. / A 32-site neural recording probe fabricated by double-sided deep reactive ion etching of silicon-on-insulator substrates. 12th Micromechanics Europe Workshop, MME, 16-18 September 2001, Cork, Ireland. 2001.
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Norlin, P, Kindlundh, M, Mouroux, A, Yoshida, K, Jensen, W & Hofmann, UG 2001, A 32-site neural recording probe fabricated by double-sided deep reactive ion etching of silicon-on-insulator substrates. i 12th Micromechanics Europe Workshop, MME, 16-18 September 2001, Cork, Ireland.

A 32-site neural recording probe fabricated by double-sided deep reactive ion etching of silicon-on-insulator substrates. / Norlin, Peter; Kindlundh, Maria; Mouroux, Aliette; Yoshida, Ken; Jensen, Winnie; Hofmann, Ulrich G.

12th Micromechanics Europe Workshop, MME, 16-18 September 2001, Cork, Ireland. 2001.

Publikation: Bidrag til bog/antologi/rapport/konference proceedingKonferenceartikel i proceedingForskning

TY - GEN

T1 - A 32-site neural recording probe fabricated by double-sided deep reactive ion etching of silicon-on-insulator substrates

AU - Norlin, Peter

AU - Kindlundh, Maria

AU - Mouroux, Aliette

AU - Yoshida, Ken

AU - Jensen, Winnie

AU - Hofmann, Ulrich G.

PY - 2001

Y1 - 2001

M3 - Article in proceeding

BT - 12th Micromechanics Europe Workshop, MME, 16-18 September 2001, Cork, Ireland

ER -

Norlin P, Kindlundh M, Mouroux A, Yoshida K, Jensen W, Hofmann UG. A 32-site neural recording probe fabricated by double-sided deep reactive ion etching of silicon-on-insulator substrates. I 12th Micromechanics Europe Workshop, MME, 16-18 September 2001, Cork, Ireland. 2001