Adsorption of Hydrogen on Clean and Potassium Modified Low Index Copper Surfaces: Cu(100) and Cu(110)

L. Thomsen, P. J. Onsgaard, P. J. Godowski, P. Møller, S. V. Hoffmann

Publikation: Bidrag til tidsskrift › Tidsskriftartikel › Forskning › peer review

Originalsprog	Engelsk
Tidsskrift	Journal of Vacuum Science & Technology. A: International Journal Devoted to Vacuum, Surfaces, and Films
Vol/bind	19
Udgave nummer	4
Sider (fra-til)	1988-1992
ISSN	1553-1813
Status	Udgivet - 2001

AUB Link

@article{d28a2150809211db8b97000ea68e967b,

title = "Adsorption of Hydrogen on Clean and Potassium Modified Low Index Copper Surfaces: Cu(100) and Cu(110)",

author = "L. Thomsen and Onsgaard, {P. J.} and Godowski, {P. J.} and P. M{\o}ller and Hoffmann, {S. V.}",

year = "2001",

language = "English",

volume = "19",

pages = "1988--1992",

journal = "Journal of Vacuum Science & Technology. A: International Journal Devoted to Vacuum, Surfaces, and Films",

issn = "1553-1813",

publisher = "American Institute of Physics",

number = "4",

}

Publikation: Bidrag til tidsskrift › Tidsskriftartikel › Forskning › peer review

TY - JOUR

T1 - Adsorption of Hydrogen on Clean and Potassium Modified Low Index Copper Surfaces: Cu(100) and Cu(110)

AU - Thomsen, L.

AU - Onsgaard, P. J.

AU - Godowski, P. J.

AU - Møller, P.

AU - Hoffmann, S. V.

PY - 2001

Y1 - 2001

M3 - Journal article

SN - 1553-1813

VL - 19

SP - 1988

EP - 1992

JO - Journal of Vacuum Science & Technology. A: International Journal Devoted to Vacuum, Surfaces, and Films

JF - Journal of Vacuum Science & Technology. A: International Journal Devoted to Vacuum, Surfaces, and Films

IS - 4

ER -