Anomalous diffusion of iodine ions into polypropylene implanted with F+ and I+ ions

Vladimir Hnatowicz, J. Kvítek, V. Švorčík, V. Rybka, Vladimir Popok

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Abstrakt

The diffusion of K and I atoms from 5 M water solution of KI into polypropylene implanted with 150 keV F+ and I+ was studied at boiling temperature. Standard Rutherford back scattering (RSB) technique was used for the determination of concentration depth profiles of diffused atoms. It was found that the I and K atoms penetrate the polymer surface layer affected by ion implantation and they are captured by trapping centers produced by electronic energy losses of implanted ions. The uptake of K atoms is several times higher than that of I atoms, and the relative K concentration exceeds the KI stoichiometric value.
OriginalsprogEngelsk
TidsskriftJournal of Applied Polymer Science
Vol/bind55
Sider (fra-til)451-454
Antal sider4
ISSN0021-8995
StatusUdgivet - 18 jan. 1995
Udgivet eksterntJa

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