Cluster Ion Implantation in Graphite and Diamond: Radiation Damage and Stopping of Cluster Constituents

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    Abstrakt

    Cluster ion beam technique is a versatile tool which can be used for controllable formation of nanosize objects as well as modification and processing of surfaces and shallow layers on an atomic scale. The current paper present an overview and analysis of data obtained on a few sets of graphite and diamond samples implanted by keV-energy size-selected cobalt and argon clusters. One of the emphases is put on pinning of metal clusters on graphite with a possibility of following selective etching of graphene layers. The other topic of concern is related to the development of scaling law for cluster implantation. Implantation of cobalt and argon clusters into two different allotropic forms of carbon, namely, graphite and diamond is analysed and compared in order to approach universal theory of cluster stopping in matter.
    OriginalsprogEngelsk
    TidsskriftReviews on Advanced Materials Science
    Vol/bind38
    Udgave nummer1
    Sider (fra-til)7-16
    Antal sider10
    ISSN1605-8127
    StatusUdgivet - 4 aug. 2014

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