Abstract
Thin films of C60 deposited in vacuum are studied using current-voltage (I-V) measurements and atomic force microscopy (AFM). In situ electrical measurements give an average resistivity of ca. 30 MOhm.cm for the as-deposited films at room temperature. The I-V dependences are found to correspond to ohmic behaviour but they have a hysteresis shape attributed to remanent polarisation due to the domain structure of the films. AFM images show a grainy surface morphology for the deposited C60. Temperature dependent measurements in the range 290-365 K provide evidence for a variable range hopping mechanism of conductance with an activation energy of 0.8-1.0 eV. With further temperature increase the C60 films restructure leading to an increase in grain size and a change of the electrical properties with I-V dependences showing Schottky barrier formation. The effect of oxygen on the conductance of the C60 films under their exposure to an ambient atmosphere is considered and discussed.
Originalsprog | Engelsk |
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Tidsskrift | Journal of Nanoscience and Nanotechnology |
Vol/bind | 7 |
Udgave nummer | 4-5 |
Sider (fra-til) | 1434-1438 |
Antal sider | 5 |
ISSN | 1533-4880 |
DOI | |
Status | Udgivet - apr. 2007 |
Udgivet eksternt | Ja |