Optimum platform design of 3-RRR planar parallel manipulators with a parameterized model

Kun Wang, Zhijiang Xie, Ruiqin Li, Shaoping Bai

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Abstract

In this work, a parameterized model of 3-RRR
planar parallel manipulator is proposed, aiming to optimize the
kinematic performance with optimum shapes and sizes of the
base and mobile platforms. In the model the inverse and direct
kinematics are addressed, upon which the global kinematic performance in terms of dexterity index is calculated and analyzed.
These analyses reveal the sensitivity of overall performance to
the dimensional and shape parameters of 3-RRR planar parallel
manipulator. Optimal configurations are obtained from the global
conditioning index atlas.
OriginalsprogEngelsk
TitelInternational Conference on Mechatronics and Automation (ICMA)
Antal sider6
ForlagIEEE
Publikationsdato2019
Sider2206-2211
Artikelnummer8816614
ISBN (Trykt)978-1-7281-1698-3
ISBN (Elektronisk)978-1-7281-1699-0
DOI
StatusUdgivet - 2019
BegivenhedICMA 2019 - International Conference on Mechatronics and Automation - , Kina
Varighed: 4 aug. 20198 aug. 2019

Konference

KonferenceICMA 2019 - International Conference on Mechatronics and Automation
Land/OmrådeKina
Periode04/08/201908/08/2019
NavnIEEE International Conference on Mechatronics and Automation (ICMA)
ISSN2152-744X

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