Artificial Intelligence Aided Design for Film Capacitors

Yong Xin Zhang, Fang Yi Chen, Qi Kun Feng, Di Fan Liu, Jia Yao Pei, Shao Long Zhong, Zhe Yang, Zhi Min Dang*

*Corresponding author for this work

Research output: Contribution to book/anthology/report/conference proceedingArticle in proceedingResearchpeer-review

3 Citations (Scopus)

Abstract

Driven by energy-related demands and the efforts of many researchers, film capacitors, with the stability of their electrical values over long durations, have become key devices in many fields, especially high current pulse loads or high AC loads in electrical systems application scenarios. With the increase in application requirements and the expansion of the application range from commercial and military, the personalized customization of film capacitors that are different from the mass production for specific application conditions becomes more and more important. At the same time, the efficiency and greening of the production process are also looking forward to the innovation of the design system of film capacitors. However, the production process of film capacitors is complex, and it is difficult to derive the functional relationship between production parameters and product performance. On the other hand, the historical accumulation of the film capacitor industry makes the relevant data resources relatively abundant. Because of the above situation, based on the Back Propagation (BP) neural network theory, this paper builds a film capacitors design model by learning the design and performance data of 54,604 film capacitors, thereby establishing the relationship between material types and capacitances of capacitors. After that, according to the established model and the given dielectric materials, the capacitances of produced film capacitors are predicted, and then the appropriate dielectric materials are screened out through reverse design according to the established model and the expected capacitances. Furthermore, this paper analyzes the distribution characteristics of the predicted value and absolute error under the two prediction directions.

Original languageEnglish
Title of host publication2022 IEEE International Conference on High Voltage Engineering and Applications, ICHVE 2022
PublisherIEEE Signal Processing Society
Publication date2022
ISBN (Electronic)9781665407502
DOIs
Publication statusPublished - 2022
Event2022 IEEE International Conference on High Voltage Engineering and Applications, ICHVE 2022 - Chongqing, China
Duration: 25 Sept 202229 Sept 2022

Conference

Conference2022 IEEE International Conference on High Voltage Engineering and Applications, ICHVE 2022
Country/TerritoryChina
CityChongqing
Period25/09/202229/09/2022
Series2022 IEEE International Conference on High Voltage Engineering and Applications, ICHVE 2022

Bibliographical note

Publisher Copyright:
© 2022 IEEE.

Keywords

  • artificial intelligence
  • artificial neural network
  • back propagation
  • design
  • film capacitor

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