Boron Electrical Activation in Dual B + N and B + Ar Implanted Silicon

Vladimir Odzhaev, Vladimir Popok, V.S. Prosolovich, Vladimir Hnatowicz

Research output: Contribution to journal › Journal article › Research › peer-review

Original language	English
Journal	Applied Physics A: Materials Science & Processing
Volume	62
Pages (from-to)	355-358
Number of pages	4
ISSN	0947-8396
Publication status	Published - 1996
Externally published	Yes

Cite this

@article{fdba03a9c17b4b668ea3a8007ed63d75,

title = "Boron Electrical Activation in Dual B + N and B + Ar Implanted Silicon",

author = "Vladimir Odzhaev and Vladimir Popok and V.S. Prosolovich and Vladimir Hnatowicz",

year = "1996",

language = "English",

volume = "62",

pages = "355--358",

journal = "Applied Physics A: Materials Science & Processing",

issn = "0947-8396",

publisher = "Physica-Verlag",

}

TY - JOUR

T1 - Boron Electrical Activation in Dual B + N and B + Ar Implanted Silicon

AU - Odzhaev, Vladimir

AU - Popok, Vladimir

AU - Prosolovich, V.S.

AU - Hnatowicz, Vladimir

PY - 1996

Y1 - 1996

M3 - Journal article

VL - 62

SP - 355

EP - 358

JO - Applied Physics A: Materials Science & Processing

JF - Applied Physics A: Materials Science & Processing

SN - 0947-8396

ER -