Cluster Ion Implantation in Graphite and Diamond: Radiation Damage and Stopping of Cluster Constituents

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    Abstract

    Cluster ion beam technique is a versatile tool which can be used for controllable formation of nanosize objects as well as modification and processing of surfaces and shallow layers on an atomic scale. The current paper present an overview and analysis of data obtained on a few sets of graphite and diamond samples implanted by keV-energy size-selected cobalt and argon clusters. One of the emphases is put on pinning of metal clusters on graphite with a possibility of following selective etching of graphene layers. The other topic of concern is related to the development of scaling law for cluster implantation. Implantation of cobalt and argon clusters into two different allotropic forms of carbon, namely, graphite and diamond is analysed and compared in order to approach universal theory of cluster stopping in matter.
    Original languageEnglish
    JournalReviews on Advanced Materials Science
    Volume38
    Issue number1
    Pages (from-to)7-16
    Number of pages10
    ISSN1605-8127
    Publication statusPublished - 4 Aug 2014

    Fingerprint

    Diamond
    Graphite
    Radiation damage
    radiation damage
    stopping
    Ion implantation
    ion implantation
    Diamonds
    graphite
    diamonds
    Argon
    Cobalt
    Scaling laws
    implantation
    cobalt
    Graphene
    Ion beams
    argon
    Etching
    metal clusters

    Keywords

    • cluster implantation
    • radiation damage
    • graphite
    • diamond

    Cite this

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    title = "Cluster Ion Implantation in Graphite and Diamond: Radiation Damage and Stopping of Cluster Constituents",
    abstract = "Cluster ion beam technique is a versatile tool which can be used for controllable formation of nanosize objects as well as modification and processing of surfaces and shallow layers on an atomic scale. The current paper present an overview and analysis of data obtained on a few sets of graphite and diamond samples implanted by keV-energy size-selected cobalt and argon clusters. One of the emphases is put on pinning of metal clusters on graphite with a possibility of following selective etching of graphene layers. The other topic of concern is related to the development of scaling law for cluster implantation. Implantation of cobalt and argon clusters into two different allotropic forms of carbon, namely, graphite and diamond is analysed and compared in order to approach universal theory of cluster stopping in matter.",
    keywords = "cluster implantation, radiation damage, graphite, diamond",
    author = "Vladimir Popok",
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    Cluster Ion Implantation in Graphite and Diamond : Radiation Damage and Stopping of Cluster Constituents. / Popok, Vladimir.

    In: Reviews on Advanced Materials Science, Vol. 38, No. 1, 04.08.2014, p. 7-16.

    Research output: Contribution to journalJournal articleResearchpeer-review

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    AU - Popok, Vladimir

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    N2 - Cluster ion beam technique is a versatile tool which can be used for controllable formation of nanosize objects as well as modification and processing of surfaces and shallow layers on an atomic scale. The current paper present an overview and analysis of data obtained on a few sets of graphite and diamond samples implanted by keV-energy size-selected cobalt and argon clusters. One of the emphases is put on pinning of metal clusters on graphite with a possibility of following selective etching of graphene layers. The other topic of concern is related to the development of scaling law for cluster implantation. Implantation of cobalt and argon clusters into two different allotropic forms of carbon, namely, graphite and diamond is analysed and compared in order to approach universal theory of cluster stopping in matter.

    AB - Cluster ion beam technique is a versatile tool which can be used for controllable formation of nanosize objects as well as modification and processing of surfaces and shallow layers on an atomic scale. The current paper present an overview and analysis of data obtained on a few sets of graphite and diamond samples implanted by keV-energy size-selected cobalt and argon clusters. One of the emphases is put on pinning of metal clusters on graphite with a possibility of following selective etching of graphene layers. The other topic of concern is related to the development of scaling law for cluster implantation. Implantation of cobalt and argon clusters into two different allotropic forms of carbon, namely, graphite and diamond is analysed and compared in order to approach universal theory of cluster stopping in matter.

    KW - cluster implantation

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    KW - graphite

    KW - diamond

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