Erbium diffusion in silicon dioxide

Y.-W. Lu; B. Julsgaard; M. C.  Petersen; Rasmus Vincentz Skougaard Jensen; Thomas Garm Pedersen; Kjeld Pedersen; Brian Bech Nielsen; Arne Nylandsted Larsen

doi:10.1063/1.3497076

Erbium diffusion in silicon dioxide

Y.-W. Lu, B. Julsgaard, M. C. Petersen, Rasmus Vincentz Skougaard Jensen, Thomas Garm Pedersen, Kjeld Pedersen, Brian Bech Nielsen, Arne Nylandsted Larsen

The Faculty of Engineering and Science

Research output: Contribution to journal › Journal article › Research › peer-review

18 Citations (Scopus)

Original language	English
Journal	Applied Physics Letters
Volume	97
Issue number	14
Pages (from-to)	141903-
Number of pages	3
ISSN	0003-6951
DOIs	https://doi.org/10.1063/1.3497076
Publication status	Published - 2010

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@article{d4192f4e3386421c90ef7d2f69c325fb,

title = "Erbium diffusion in silicon dioxide",

author = "Y.-W. Lu and B. Julsgaard and Petersen, {M. C.} and Jensen, {Rasmus Vincentz Skougaard} and Pedersen, {Thomas Garm} and Kjeld Pedersen and Nielsen, {Brian Bech} and Larsen, {Arne Nylandsted}",

year = "2010",

doi = "10.1063/1.3497076",

language = "English",

volume = "97",

pages = "141903--",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

number = "14",

}

TY - JOUR

T1 - Erbium diffusion in silicon dioxide

AU - Lu, Y.-W.

AU - Julsgaard, B.

AU - Petersen, M. C.

AU - Jensen, Rasmus Vincentz Skougaard

AU - Pedersen, Thomas Garm

AU - Pedersen, Kjeld

AU - Nielsen, Brian Bech

AU - Larsen, Arne Nylandsted

PY - 2010

Y1 - 2010

U2 - 10.1063/1.3497076

DO - 10.1063/1.3497076

M3 - Journal article

SN - 0003-6951

VL - 97

SP - 141903-

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 14

ER -