Nanohillock formation by impact of small low-energy clusters with-surfaces

Vladimir Popok, S. Prasalovich, Eleanor E.B. Campbell

Research output: Contribution to journalJournal articlepeer-review

25 Citations (Scopus)

Abstract

Results on nanoscale structuring of different substrates (silicon, pyrolytic graphite, indium-tin-oxide) using clusters from 20 to 100 atoms in size formed from gaseous precursors (O2, N2, Ar) at relatively low impact energy up to 15 keV are presented. Images of the substrate surfaces after cluster collisions obtained using atomic force microscopy (AFM) show the formation of hillocks from a few to 15 nm height with a basal diameter from 50 to 300 nm depending on implantation conditions. The shape and size of the structures are found to be a function of the cluster size and species, implantation energy, impact angle and the type of substrate. A model explaining the hillock formation is discussed.
Original languageEnglish
JournalNuclear Instruments and Methods in Physics Reseach B
Volume207
Issue number2
Pages (from-to)145-153
Number of pages9
ISSN0168-583X
Publication statusPublished - Jun 2003
Externally publishedYes

Keywords

  • Pulsed cluster source
  • Cluster ion implantation
  • Nanosize hillock
  • Atomic force microscopy

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