Sputtering of fullerene by noble gas ions at high fluences

D. Fink; M. Müller; R. Klett; L. T. Chadderton; L. Palmetshofer; J. Kastner; J. Vacik; V. Hnatowicz; V. Popok

doi:10.1016/0168-583X(95)00662-1

Sputtering of fullerene by noble gas ions at high fluences

D. Fink^*, M. Müller, R. Klett, L. T. Chadderton, L. Palmetshofer, J. Kastner, J. Vacik, V. Hnatowicz, V. Popok

^*Corresponding author for this work

Research output: Contribution to journal › Journal article › Research › peer-review

17 Citations (Scopus)

Abstract

Noble gas ions have been implanted into fullerene in the solid state up to fluences which far exceed the molecular destruction threshold. The corresponding depth profile peaks in Rutherford backscattering experiments move strongly towards the surface signal with increasing fluence. This suggests a high degree of target erosion due to collisional sputtering. One consequence of this process can be an interesting and basic effect on the nature of the fullerene destruction products.

Original language	English
Journal	Nuclear Inst. and Methods in Physics Research, B
Volume	103
Issue number	4
Pages (from-to)	415-422
Number of pages	8
ISSN	0168-583X
DOIs	https://doi.org/10.1016/0168-583X(95)00662-1
Publication status	Published - 1 Dec 1995

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title = "Sputtering of fullerene by noble gas ions at high fluences",

abstract = "Noble gas ions have been implanted into fullerene in the solid state up to fluences which far exceed the molecular destruction threshold. The corresponding depth profile peaks in Rutherford backscattering experiments move strongly towards the surface signal with increasing fluence. This suggests a high degree of target erosion due to collisional sputtering. One consequence of this process can be an interesting and basic effect on the nature of the fullerene destruction products.",

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AU - Fink, D.

AU - Müller, M.

AU - Klett, R.

AU - Chadderton, L. T.

AU - Palmetshofer, L.

AU - Kastner, J.

AU - Vacik, J.

AU - Hnatowicz, V.

AU - Popok, V.

PY - 1995/12/1

Y1 - 1995/12/1

N2 - Noble gas ions have been implanted into fullerene in the solid state up to fluences which far exceed the molecular destruction threshold. The corresponding depth profile peaks in Rutherford backscattering experiments move strongly towards the surface signal with increasing fluence. This suggests a high degree of target erosion due to collisional sputtering. One consequence of this process can be an interesting and basic effect on the nature of the fullerene destruction products.

AB - Noble gas ions have been implanted into fullerene in the solid state up to fluences which far exceed the molecular destruction threshold. The corresponding depth profile peaks in Rutherford backscattering experiments move strongly towards the surface signal with increasing fluence. This suggests a high degree of target erosion due to collisional sputtering. One consequence of this process can be an interesting and basic effect on the nature of the fullerene destruction products.

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DO - 10.1016/0168-583X(95)00662-1

M3 - Journal article

AN - SCOPUS:0001079111

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EP - 422

JO - Nuclear Inst. and Methods in Physics Research, B

JF - Nuclear Inst. and Methods in Physics Research, B

IS - 4

ER -

Sputtering of fullerene by noble gas ions at high fluences

Abstract

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