Stopping of energetic argon cluster ions in graphite: role of cluster momentum and charge

Vladimir Popok, Juha Samela, Kai Nordlund, Eleanor E.B. Campbell

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Abstract

We show that the implantation depth for argon clusters in graphite scales linearly with cluster momentum. A plot of implantation depth versus the momentum scaled with the projected surface area of the cluster falls on the same universal plot as that shown for semiconductor and metallic clusters, thus providing a universal scaling law for cluster implantation. Molecular dynamics simulations provide some insight to the mechanisms behind the empirical observation.
Original languageEnglish
Article number201403(R)
JournalPhysical Review B (Condensed Matter and Materials Physics)
Volume82
Issue number20
Number of pages4
ISSN1098-0121
DOIs
Publication statusPublished - 8 Nov 2010
Externally publishedYes

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Cite this

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abstract = "We show that the implantation depth for argon clusters in graphite scales linearly with cluster momentum. A plot of implantation depth versus the momentum scaled with the projected surface area of the cluster falls on the same universal plot as that shown for semiconductor and metallic clusters, thus providing a universal scaling law for cluster implantation. Molecular dynamics simulations provide some insight to the mechanisms behind the empirical observation.",
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Stopping of energetic argon cluster ions in graphite: role of cluster momentum and charge. / Popok, Vladimir; Samela, Juha; Nordlund, Kai; Campbell, Eleanor E.B.

In: Physical Review B (Condensed Matter and Materials Physics), Vol. 82, No. 20, 201403(R), 08.11.2010.

Research output: Contribution to journalJournal articleResearchpeer-review

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AU - Popok, Vladimir

AU - Samela, Juha

AU - Nordlund, Kai

AU - Campbell, Eleanor E.B.

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Y1 - 2010/11/8

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AB - We show that the implantation depth for argon clusters in graphite scales linearly with cluster momentum. A plot of implantation depth versus the momentum scaled with the projected surface area of the cluster falls on the same universal plot as that shown for semiconductor and metallic clusters, thus providing a universal scaling law for cluster implantation. Molecular dynamics simulations provide some insight to the mechanisms behind the empirical observation.

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DO - 10.1103/PhysRevB.82.201403

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